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Please use this identifier to cite or link to this item: http://repository.iitr.ac.in/handle/123456789/4089
Title: Grain growth stagnation in gold thin films on annealing in vacuum
Authors: Dash P.
Rath H.
Dash B.N.
Som T.
Singh U.P.
Ojha S.
Kanjilal D.
Mishra N.C.
Published in: Advanced Science Letters
Abstract: Thermally evaporated gold thin films of 10 to 50 nm thickness deposited on Si (100) substrate were annealed at 250 °C under vacuum for different period. The as-deposited and annealed films were characterized by glancing angle X-ray diffraction (GAXRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), Rutherford backscattering spectrometry (RBS) and d. c. resistivity. GAXRD indicated improvement of crystallite size up to 2 hours of annealing and degradation of the same thereafter. In agreement with XRD result, AFM and SEM indicated grain growth with annealing time up to 2 hours and stagnation or even decrease of grain size thereafter. The dependence of the grain size evolution with annealing time on the thickness of the film was seen from RBS, which corroborated the XRD, AFM and SEM results. The electrical resistivity of the films of different thickness also showed the same trend of evolution with annealing time, clearly indicating the importance of microstructure in controlling the electrical conduction in the films. Power spectral density (PSD) analysis of AFM images indicated that surface morphology evolution in gold thin films under annealing is dominated by surface diffusion mass transport. This unusual result of the suppression of crystallinity on annealing beyond a particular period is understood by two competing processes: grain growth due to accelerated particle diffusion across rough surfaces under annealing and smoothening of grain surface with formation of grooves at the boundary between adjacent grains inhibiting further grain growth. © 2014 American Scientific Publishers All rights reserved.
Citation: Advanced Science Letters (2014), 20(43894): 552-558
URI: https://doi.org/10.1166/asl.2014.5415
http://repository.iitr.ac.in/handle/123456789/4089
Issue Date: 2014
Publisher: American Scientific Publishers
Keywords: Annealing
Grain growth stagnation
Thin films
ISSN: 19366612
Author Scopus IDs: 57197044068
55397429100
57210678652
7003595645
57203181883
7102952498
26642946700
35466198800
Author Affiliations: Dash, P., Department of Physics, Utkal University, Bhubaneswar 751004, India
Rath, H., Department of Physics, Utkal University, Bhubaneswar 751004, India
Dash, B.N., Department of Physics, Utkal University, Bhubaneswar 751004, India
Som, T., Institutes of Physics, Bhubaneswar 751005, India
Singh, U.P., KIIT University, Bhubaneswar 751005, India
Ojha, S., Inter-University Accelerator Centre, New Delhi 110067, India
Kanjilal, D., Inter-University Accelerator Centre, New Delhi 110067, India
Mishra, N.C., Department of Physics, Utkal University, Bhubaneswar 751004, India
Corresponding Author: Dash, P.; Department of Physics, Utkal University, Bhubaneswar 751004, India
Appears in Collections:Journal Publications [CY]

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