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Please use this identifier to cite or link to this item: http://repository.iitr.ac.in/handle/123456789/3037
Title: Efficient trivalent bath for the recovery of chromium
Authors: Deep A.
Malik P.
Gupta B.
Tandon S.N.
Published in: Plating and Surface Finishing
Abstract: An electroplating bath for the deposition of chromium from its trivalent solution in dilute sulfuric acid is proposed. A simple two-compartment cell with a cylindrical silver anode and a rotating copper disc cathode has been employed. The effect of factors such as concentration of Cr(III) and H+ ions, role of additive and current density on the deposition rate has been studied. At an average current density of 125 A/dm2, a cathode efficiency of around 45 percent is achieved from a bath containing 7 g/L Cr(III) and 1 g/L Na2SO4 maintained at a pH of 1.4. The deposits are in semibright nodular form. The practical utility of the proposed bath has been demonstrated by recovering pure chromium from chromium-laden effluent from a tannery.
Citation: Plating and Surface Finishing (2001), 88(3): 76-77
URI: http://repository.iitr.ac.in/handle/123456789/3037
Issue Date: 2001
ISSN: 3603164
Author Scopus IDs: 6602909701
7103280667
7402195167
24523635700
Author Affiliations: Deep, A., Chemistry Department, University of Roorkee, Roorkee, UP, India
Malik, P., Chemistry Department, University of Roorkee, Roorkee, UP, India
Gupta, B., Chemistry Department, University of Roorkee, Roorkee, UP, India
Tandon, S.N., Chemistry Department, University of Roorkee, Roorkee, UP, India, University of Allahabad, Allahabad, UP, India, Carnegie Mellon University, Pittsburgh, PA, United States, University of California, Los Angeles, LA, United States
Corresponding Author: Tandon, S.N.; Chemistry Department, University of Roorkee, Roorkee, UP, India; email: tandnfcy@rurkiu.ernet.in
Appears in Collections:Journal Publications [CY]

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