http://repository.iitr.ac.in/handle/123456789/2779
Title: | Study of catechol and resorcinol adsorption mechanism through granular activated carbon characterization, pH and kinetic study |
Authors: | Suresh S. Srivastava, Vimal Chandra Mishra I.M. |
Published in: | Separation Science and Technology |
Abstract: | The present article reports results of the studies on adsorptive removal of catechol and resorcinol from aqueous solution by granular activated carbon (GAC). Physico-chemical characterization including surface area, X-ray diffraction (XRD) analysis, scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), and Fourier transform infrared spectroscopy (FTIR) of the GAC before and after catechol and resorcinol adsorption have been done to understand the adsorption mechanism. Bulk density and heating value of GAC were found to be 725 kg/m3 and 8.26 MJ/kg, respectively. The BET surface area was 977.6m2/g whereas the BET average pore diameter was 18.79 Å. Different experimental parameters like initial pH, initial dosage, contact time, and initial concentration were evaluated for their effect on the adsorption of catechol and resorcinol onto GAC. The kinetics of adsorption was found to be described by the pseudo-second order equation. Results of the intra-particle diffusion model show that the pore diffusion is not the only rate limiting step. The effective diffusion coefficient of catechol and resorcinol were of the order of 2.9×10-10 and 2.2×10-10m2/s. © Taylor & Francis Group, LLC. |
Citation: | Separation Science and Technology (2011), 46(11): 1750-1766 |
URI: | https://doi.org/10.1080/01496395.2011.570284 http://repository.iitr.ac.in/handle/123456789/2779 |
Issue Date: | 2011 |
Keywords: | BET surface area Catechol FTIR Granular activated carbon Kinetics Resorcinol |
ISSN: | 1496395 |
Author Scopus IDs: | 22935957500 35565811700 23668474600 |
Author Affiliations: | Suresh, S., Department of Chemical Engineering, Indian Institute of Technology Roorkee, Roorkee-247667, Uttarakhand, India, Department of Chemical Engineering, Maulana Azad National Institute of Technology Bhopal, Bhopal-462051, M.P, India Srivastava, V.C., Department of Chemical Engineering, Indian Institute of Technology Roorkee, Roorkee-247667, Uttarakhand, India, Department of Chemical Engineering, Maulana Azad National Institute of Technology Bhopal, Bhopal-462051, M.P, India Mishra, I.M., Department of Chemical Engineering, Indian Institute of Technology Roorkee, Roorkee-247667, Uttarakhand, India, Department of Chemical Engineering, Maulana Azad National Institute of Technology Bhopal, Bhopal-462051, M.P, India |
Funding Details: | Phenolic compounds, such as catechol and resorcinol, are found in the effluents discharged from manufacturing units of textile, paper and pulp, steel, petrochemical, petroleum refinery, rubber, dyes, plastics, pharmaceutical, cosmetics, etc. (1). The toxicity of catechol for water flea, zebra fish, trout, rabbit, cat, rat, and human cell lines is well demonstrated (2). Catechol is strongly irritating to eyes, skin, and the respiratory tract, and has been a proven cause for DNA damage, vascular collapse, coma, and death. Catechol is considered to be more toxic than resorcinol, and both are considered to be more toxic than phenol (3,4). Owing to their toxicity, the removal of catechol and resorcinol from wastewater is necessary. Phenol and associated compounds have been listed as priority pollutants by the Ministry of Environment and Forests (MoEF), Government of India; and the United States Environmental Protection Agency (USEPA). MoEF has prescribed that the concentration of phenols (measured as phenol) should not exceed 1.0 mg/L for their discharge into the surface waters and 5.0 mg/L for discharge into the public sewers, on land for irrigation, and marine coastal areas. |
Corresponding Author: | Srivastava, V. C.; Department of Chemical Engineering, Indian Institute of Technology Roorkee, Roorkee-247667, Uttarakhand, India; email: vimalcsr@yahoo.co.in |
Appears in Collections: | Journal Publications [CH] |
Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.