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Please use this identifier to cite or link to this item: http://repository.iitr.ac.in/handle/123456789/2694
Title: Electrochemical mineralization of chlorophenol by ruthenium oxide coated titanium electrode
Authors: Chauhan R.
Srivastava, Vimal Chandra
Hiwarkar A.D.
Published in: Journal of the Taiwan Institute of Chemical Engineers
Abstract: Electrochemical oxidation of 4-chlorophenol (CP) was investigated (in terms of chemical oxygen demand (COD) and CP removal efficiencies) by using a dimensionally stable anode (DSA) namely ruthenium oxide coated titanium (Ti/RuO2) electrode. Effect of process conditions such as current density (j), electrolyte concentration (m), initial pH (pHo), time (t) and initial CP concentration (Co) has been studied. Current efficiency (CE) and specific energy consumption (SEC) were also measured. Gas chromatograph-mass spectrometry (GC/MS) analysis was used to understand the CP mineralization mechanism which has been established on the basis of intermediates identified such as benzoquinone, hydroquinone and organic acids. Reaction kinetics was expressed by pseudo-first order kinetic model. Maximum COD removal efficiency of 96.7% and CP removal efficiency of 97.2%, respectively, was observed at j =?222.22 A/m2, t =?180 min, pHo =?5.2 and m =?400 mg/l with SEC =?655 kWh/kg COD. Operating cost based on the studies performed on laboratory scale EC reactor has been calculated and compared with those reported for other pollutants degradation. © 2016 Taiwan Institute of Chemical Engineers
Citation: Journal of the Taiwan Institute of Chemical Engineers (2016), 69(): 106-117
URI: https://doi.org/10.1016/j.jtice.2016.10.016
http://repository.iitr.ac.in/handle/123456789/2694
Issue Date: 2016
Publisher: Taiwan Institute of Chemical Engineers
Keywords: Chlorophenol
Current efficiency
Degradation mechanism
Electrochemical degradation
Kinetics
Specific energy consumption
ISSN: 18761070
Author Scopus IDs: 57197047692
35565811700
56362746800
Author Affiliations: Chauhan, R., Department of Chemical Engineering, Indian Institute of Technology Roorkee, Roorkee, Uttarakhand 247667, India
Srivastava, V.C., Department of Chemical Engineering, Indian Institute of Technology Roorkee, Roorkee, Uttarakhand 247667, India
Hiwarkar, A.D., Department of Chemical Engineering, Indian Institute of Technology Roorkee, Roorkee, Uttarakhand 247667, India
Corresponding Author: Srivastava, V.C.; Department of Chemical Engineering, Indian Institute of Technology RoorkeeIndia; email: vimalcsr@yahoo.co.in
Appears in Collections:Journal Publications [CH]

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