http://repository.iitr.ac.in/handle/123456789/25215
Title: | Oxovanadium(IV) complex of β-alanine derived ligand immobilised on polystyrene for the oxidation of various organic substrates |
Authors: | Maurya, Mannar Ram Sikarwar S. Kumar M. |
Published in: | Catalysis Communications |
Abstract: | Tridentate Schiff base (H2fsal-β-ala) obtained from 3-formylsalicylic acid and β-alanine has been covalently bonded to divinylbenzene cross-linked chloromethylated polystyrene. This chelating resin, abbreviated as PS-H2fsal-β-ala (PS = polymeric support), reacts with vanadyl sulfate in DMF to give polymer bound complex, PS-[VO(fsal-β-ala) · DMF], formation of which has been confirmed by various physiochemical methods such as elemental analysis, FT-IR and diffused reflectance spectra, thermo gravimetric analysis, and scanning electron micrograph. Catalytic potential of PS-[VO(fsal-β-ala) · DMF] has been tested for the oxidation of various organic substrates such as benzene, cumene, naphthalene, cyclohexane, styrene, cyclohexene and trans-stilbene in the presence of 30% H2O2 as an oxidant. Oxidation products obtained from each substrate have been characterised by gas chromatography and their identities confirmed by gas chromatography-mass spectrometry. © 2007 Elsevier B.V. All rights reserved. |
Citation: | Catalysis Communications, 8(12): 2017-2024 |
URI: | https://doi.org/10.1016/j.catcom.2007.03.031 http://repository.iitr.ac.in/handle/123456789/25215 |
Issue Date: | 2007 |
Keywords: | Chloromethylated polystyrene Oxidation reactions Oxovanadium(IV) complex Polymer-anchored complex |
ISSN: | 15667367 |
Author Scopus IDs: | 7005255411 8641874100 57211647626 |
Author Affiliations: | Maurya, M.R., Department of Chemistry, Indian Institute of Technology Roorkee, Roorkee, 247667, India Sikarwar, S., Department of Chemistry, Indian Institute of Technology Roorkee, Roorkee, 247667, India Kumar, M., Department of Chemistry, Indian Institute of Technology Roorkee, Roorkee, 247667, India |
Funding Details: | One of the authors (SS) is thankful to Indian Institute of Technology Roorkee for providing MHRD fellowship. Authors are also thankful to Thermax Limited, Pune, India for providing chloromethylated polystyrene as a gift. MRM acknowledges to the Council of Scientific and Industrial Research, New Delhi for financial support. Indian Institute of Technology Roorkee, IITR; Ministry of Human Resource Development, MHRD |
Corresponding Author: | Maurya, M.R.; Department of Chemistry, , Roorkee, 247667, India; email: rkmanfcy@iitr.ernet.in |
Appears in Collections: | Journal Publications [CY] |
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