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Please use this identifier to cite or link to this item: http://repository.iitr.ac.in/handle/123456789/25215
Title: Oxovanadium(IV) complex of β-alanine derived ligand immobilised on polystyrene for the oxidation of various organic substrates
Authors: Maurya, Mannar Ram
Sikarwar S.
Kumar M.
Published in: Catalysis Communications
Abstract: Tridentate Schiff base (H2fsal-β-ala) obtained from 3-formylsalicylic acid and β-alanine has been covalently bonded to divinylbenzene cross-linked chloromethylated polystyrene. This chelating resin, abbreviated as PS-H2fsal-β-ala (PS = polymeric support), reacts with vanadyl sulfate in DMF to give polymer bound complex, PS-[VO(fsal-β-ala) · DMF], formation of which has been confirmed by various physiochemical methods such as elemental analysis, FT-IR and diffused reflectance spectra, thermo gravimetric analysis, and scanning electron micrograph. Catalytic potential of PS-[VO(fsal-β-ala) · DMF] has been tested for the oxidation of various organic substrates such as benzene, cumene, naphthalene, cyclohexane, styrene, cyclohexene and trans-stilbene in the presence of 30% H2O2 as an oxidant. Oxidation products obtained from each substrate have been characterised by gas chromatography and their identities confirmed by gas chromatography-mass spectrometry. © 2007 Elsevier B.V. All rights reserved.
Citation: Catalysis Communications, 8(12): 2017-2024
URI: https://doi.org/10.1016/j.catcom.2007.03.031
http://repository.iitr.ac.in/handle/123456789/25215
Issue Date: 2007
Keywords: Chloromethylated polystyrene
Oxidation reactions
Oxovanadium(IV) complex
Polymer-anchored complex
ISSN: 15667367
Author Scopus IDs: 7005255411
8641874100
57211647626
Author Affiliations: Maurya, M.R., Department of Chemistry, Indian Institute of Technology Roorkee, Roorkee, 247667, India
Sikarwar, S., Department of Chemistry, Indian Institute of Technology Roorkee, Roorkee, 247667, India
Kumar, M., Department of Chemistry, Indian Institute of Technology Roorkee, Roorkee, 247667, India
Funding Details: One of the authors (SS) is thankful to Indian Institute of Technology Roorkee for providing MHRD fellowship. Authors are also thankful to Thermax Limited, Pune, India for providing chloromethylated polystyrene as a gift. MRM acknowledges to the Council of Scientific and Industrial Research, New Delhi for financial support. Indian Institute of Technology Roorkee, IITR; Ministry of Human Resource Development, MHRD
Corresponding Author: Maurya, M.R.; Department of Chemistry, , Roorkee, 247667, India; email: rkmanfcy@iitr.ernet.in
Appears in Collections:Journal Publications [CY]

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