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Please use this identifier to cite or link to this item: http://repository.iitr.ac.in/handle/123456789/18565
Title: Towards the fabrication of a UV light source based on CuCl thin films
Authors: Mitra, Anirban
Lucas F.O.
O'Reilly L.
McNally P.J.
Daniels S.
Natarajan G.
Published in: Journal of Materials Science: Materials in Electronics
Abstract: CuCl is an ionic wide band gap I-VII semiconductor which has a band gap of 3.4 eV (at 300 K) and a large excitonic binding energy of 190 meV compared to other wide band gap semiconductors, e.g. ZnO (60 meV) and GaN (25 meV). It can be useful as a UV source which can emit light in the blue-UV range. The large excitonic binding energy of CuCl should improve the quantum efficiency compared to ZnO or GaN. In room temperature UV-VIS spectroscopy measurements we have observed strong free Z 3 and Z 1,2 excitonic peaks in vacuum-deposited CuCl films incorporated within structures for electroluminescent devices. Using room temperature photoluminescence (PL) we have also observed a strong free excitonic peak which is attributed to Z 3. We also report on the design of a UV source using electrically pumped CuCl thin films on Si and ITO coated glass substrates. This could open up the possibility of fabricating UV/blue light emitters utilizing CuCl. © Springer Science+Business Media, LLC 2007.
Citation: Journal of Materials Science: Materials in Electronics, (2007), 21- 23
URI: https://doi.org/10.1007/s10854-007-9178-8
http://repository.iitr.ac.in/handle/123456789/18565
Issue Date: 2007
Keywords: Free excitonic peak
Wide band gap semiconductors
Binding energy
Copper compounds
Energy gap
Excitons
Luminescent devices
Photoluminescence
Quantum efficiency
Ultraviolet radiation
Thin films
ISSN: 9574522
Author Scopus IDs: 57209787039
10739690200
15056648200
7102317773
8842395600
7004035980
Author Affiliations: Mitra, A., Nanomaterials Processing Laboratory, Research Institute for Networks and Communications Engineering (RINCE), Dublin City University, Dublin 9, Ireland
Lucas, F.O., Nanomaterials Processing Laboratory, Research Institute for Networks and Communications Engineering (RINCE), Dublin City University, Dublin 9, Ireland
O'Reilly, L., Nanomaterials Processing Laboratory, Research Institute for Networks and Communications Engineering (RINCE), Dublin City University, Dublin 9, Ireland
McNally, P.J., Nanomaterials Processing Laboratory, Research Institute for Networks and Communications Engineering (RINCE), Dublin City University, Dublin 9, Ireland
Daniels, S., Nanomaterials Processing Laboratory, National Centre for Plasma Science and Technology (NCPST), Dublin City University, Dublin 9, Ireland
Natarajan, G., Nanomaterials Processing Laboratory, National Centre for Plasma Science and Technology (NCPST), Dublin City University, Dublin 9, Ireland
Corresponding Author: Mitra, A.; Nanomaterials Processing Laboratory, Research Institute for Networks and Communications Engineering (RINCE), Dublin City University, Dublin 9, Ireland; email: Anirban.Mitra@eeng.dcu.ie
Appears in Collections:Conference Publications [PH]

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