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Please use this identifier to cite or link to this item: http://repository.iitr.ac.in/handle/123456789/18559
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dc.contributor.authorMishra A.-
dc.contributor.authorSrivastava S.K.-
dc.contributor.authorKumar A.-
dc.contributor.authorDubey P.-
dc.contributor.authorChauhan S.-
dc.contributor.authorSingh A.K.-
dc.contributor.authorKaur, Davinder-
dc.contributor.authorCh-
dc.contributor.authorra R.-
dc.date.accessioned2020-12-03T03:44:13Z-
dc.date.available2020-12-03T03:44:13Z-
dc.date.issued2014-
dc.identifier.citationThin Solid Films, (2014), 142- 146-
dc.identifier.issn406090-
dc.identifier.urihttps://doi.org/10.1016/j.tsf.2014.08.014-
dc.identifier.urihttp://repository.iitr.ac.in/handle/123456789/18559-
dc.description.abstractIn the present work thin films of off-stoichiometric Ni-Mn-Al thin films have been successfully deposited on Si substrates. The films have been deposited by DC/RF magnetron sputtering by co-sputtering of the targets of Ni, Mn and Al. The films have been s-
dc.language.isoen_US-
dc.publisherElsevier-
dc.relation.ispartofThin Solid Films-
dc.subjectExchange bias-
dc.subjectHeusler alloy-
dc.subjectMechanical property-
dc.subjectSpin glass-
dc.titleThickness dependent exchange bias in co-sputter deposited Ni-Mn-Al Heusler alloy hard nanostructured thin films-
dc.typeConference Paper-
dc.scopusid57214672224-
dc.scopusid24361388100-
dc.scopusid57214420311-
dc.scopusid56478375000-
dc.scopusid7203036965-
dc.scopusid56130494500-
dc.scopusid7004805387-
dc.scopusid56591551200-
dc.affiliationMishra, A., Centre for Nanotechnology, Indian Institute of Technology Roorkee, Roorkee, India-
dc.affiliationSrivastava, S.K., Physics Department, D.B.S. (PG) College, Dehradun, India-
dc.affiliationKumar, A., Physics Department, Indian Institute of Technology Roorkee, Roorkee, Indi-
dc.description.correspondingauthorChandra, R.; Institute Instrumentation Centre, Indian Institute of Technology RoorkeeIndia-
Appears in Collections:Conference Publications [PH]

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