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Please use this identifier to cite or link to this item: http://repository.iitr.ac.in/handle/123456789/18378
Title: Influence of sputtering parameters and gases on microstructure of Chromium Nitride films
Authors: Shah H.N.
Jayaganthan R.
Kaur, Davinder
Ch
ra R.
Published in: Thin Solid Films
Abstract: Chromium nitride thin films were deposited on SA-304 stainless steel substrates by using direct-current reactive magnetron sputtering. The influence of process conditions such as nitrogen content in the fed gas, substrate temperature, and different sputte
Citation: Thin Solid Films, (2010), 5762- 5768
URI: https://doi.org/10.1016/j.tsf.2010.05.095
http://repository.iitr.ac.in/handle/123456789/18378
Issue Date: 2010
Keywords: Coatings
Hardness
Scanning electron microscopy
Sputtering
Surface morphology
X-ray diffraction
ISSN: 406090
Author Scopus IDs: 11140853600
6602183770
7004805387
56591551200
Author Affiliations: Shah, H.N., Department of Metallurgical and Materials Engineering, Centre of Nanotechnology, Indian Institute of Technology Roorkee, Roorkee-247667, India
Jayaganthan, R., Department of Metallurgical and Materials Engineering, Centre of Nanotechnology, I
Funding Details: One of the authors, Hetal N Shah, would like to thank the management of Charotar University of Science and Technology, Changa for their sponsorship in the research work and Quality Improving Program of AICTE, New Delhi, in India for their partial financia
Corresponding Author: Jayaganthan, R.; Department of Metallurgical and Materials Engineering, Centre of Nanotechnology, Indian Institute of Technology Roorkee, Roorkee-247667, India; email: rjayafmt@iitr.ernet.in
Appears in Collections:Conference Publications [PH]

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