http://repository.iitr.ac.in/handle/123456789/14093
Title: | Mechanical properties of nanostructured copper/hydrogenated amorphous carbon multilayer films grown in a low base vacuum system |
Authors: | Dwivedi N. Kumar S. Kaur, Davinder Rauthan C.M.S. Panwar O.S. |
Published in: | Optoelectronics and Advanced Materials |
Abstract: | Nanostructured copper/hydrogenated amorphous carbon (Cu/a-C:H) multilayer films have been deposited in a low base vacuum system (base pressure 1x10-3 Torr) and studied for their mechanical properties. The analysis shows very low residual stress (below 1 G |
Citation: | Optoelectronics and Advanced Materials (2010), 4(): 604-910 |
URI: | http://repository.iitr.ac.in/handle/123456789/14093 |
Issue Date: | 2010 |
Publisher: | National Institute of Optoelectronics |
Keywords: | Copper/hydrogenated amorphous carbon multilayer Nanohardness Nanostructure Surface roughness |
ISSN: | 18426573 |
Author Scopus IDs: | 8888482400 57213855905 7004805387 6507995223 7004459093 |
Author Affiliations: | Dwivedi, N., Plasma Processed Materials Group, National Physical Laboratory (CSIR), New Delhi, 110012, India, Department of Physics and Centre of Nanotechnology, Indian Institute of Technology, Roorkee 247667, India Kumar, S., Plasma Processed Materials |
Corresponding Author: | Kumar, S.; Plasma Processed Materials Group, National Physical Laboratory (CSIR), New Delhi, 110012, India; email: skumar@nplindia.org |
Appears in Collections: | Journal Publications [PH] |
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