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Please use this identifier to cite or link to this item: http://repository.iitr.ac.in/handle/123456789/14093
Title: Mechanical properties of nanostructured copper/hydrogenated amorphous carbon multilayer films grown in a low base vacuum system
Authors: Dwivedi N.
Kumar S.
Kaur, Davinder
Rauthan C.M.S.
Panwar O.S.
Published in: Optoelectronics and Advanced Materials
Abstract: Nanostructured copper/hydrogenated amorphous carbon (Cu/a-C:H) multilayer films have been deposited in a low base vacuum system (base pressure 1x10-3 Torr) and studied for their mechanical properties. The analysis shows very low residual stress (below 1 G
Citation: Optoelectronics and Advanced Materials (2010), 4(): 604-910
URI: http://repository.iitr.ac.in/handle/123456789/14093
Issue Date: 2010
Publisher: National Institute of Optoelectronics
Keywords: Copper/hydrogenated amorphous carbon multilayer
Nanohardness
Nanostructure
Surface roughness
ISSN: 18426573
Author Scopus IDs: 8888482400
57213855905
7004805387
6507995223
7004459093
Author Affiliations: Dwivedi, N., Plasma Processed Materials Group, National Physical Laboratory (CSIR), New Delhi, 110012, India, Department of Physics and Centre of Nanotechnology, Indian Institute of Technology, Roorkee 247667, India
Kumar, S., Plasma Processed Materials
Corresponding Author: Kumar, S.; Plasma Processed Materials Group, National Physical Laboratory (CSIR), New Delhi, 110012, India; email: skumar@nplindia.org
Appears in Collections:Journal Publications [PH]

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