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Please use this identifier to cite or link to this item: http://repository.iitr.ac.in/handle/123456789/13985
Title: Influence of silicon content on the microstructure and hardness of CrN coatings deposited by reactive magnetron sputtering
Authors: Shah H.N.
Jayaganthan R.
Kaur, Davinder
Published in: Materials Chemistry and Physics
Abstract: CrN and CrSiN films were deposited on the stainless steel and silicon substrates by DC magnetron sputtering and their microstructural features were investigated by X-ray diffraction (XRD), scanning electron microscope (FE-SEM/EDS), and atomic force micros
Citation: Materials Chemistry and Physics (2010), 121(): 567-571
URI: https://doi.org/10.1016/j.matchemphys.2010.02.024
http://repository.iitr.ac.in/handle/123456789/13985
Issue Date: 2010
Keywords: Electron microscopy
Hardness
Sputtering
Thin films
ISSN: 2540584
Author Scopus IDs: 11140853600
6602183770
7004805387
Author Affiliations: Shah, H.N., Department of Metallurgical and Materials Engineering, Centre of Nanotechnology, Indian Institute of Technology Roorkee, 247667, India
Jayaganthan, R., Department of Metallurgical and Materials Engineering, Centre of Nanotechnology, Indian In
Corresponding Author: Jayaganthan, R.; Department of Metallurgical and Materials Engineering, Centre of Nanotechnology, Indian Institute of Technology Roorkee, 247667, India; email: rjayafmt@iitr.ernet.in
Appears in Collections:Journal Publications [PH]

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