http://repository.iitr.ac.in/handle/123456789/13957
Title: | Impact on structural, optical and electrical properties of CuCl by incorporation of Zn for n-type doping |
Authors: | O'Reilly L. Mitra, Anirban Natarajan G. Lucas O.F. McNally P.J. Daniels S. Cameron D.C. Bradley A.L. Reader A. Lau S. Yu S. Yi G. Kawasaki M. |
Published in: | Journal of Crystal Growth |
Abstract: | γ-CuCl is a wide-band gap (Eg=3.395eV at 4 K), direct band gap, semiconductor material with a cubic zincblende lattice structure. A very large exciton binding energy (190 meV), assures efficient exciton-based emission at room temperature. Its lattice constant, aCuCl=0.541nm means that the lattice mismatch to Si (aSi=0.543nm) is <0.5%. γ-CuCl on Si - the growth of a wide-band gap, direct band gap, optoelectronics material on silicon substrate is a novel material system, with compatibility to current Si-based electronic/optoelectronics technologies. Both n-type and p-type CuCl will be required for development of homojunction light-emitting diodes (LEDs). The authors report on the impact of incorporation of Zn for n-type doping of CuCl by co-evaporation of CuCl and ZnCl2. Polycrystalline Zn-doped γ-CuCl thin films are grown on Si (1 1 1), Si (1 0 0), and glass substrates by physical vapour deposition. X-ray diffraction (XRD) studies confirm that this n-doped CuCl has a cubic zincblende structure with a preferred (1 1 1) orientation. Several excitonic bands are evident in low-temperature photoluminescence (PL) measurements such as the Z3 free exciton at ∼388 nm; I1-bound exciton at ∼392 nm and M free biexciton at ∼393 nm. Cathodoluminescence (CL) and PL reveal a strong room temperature Z3 excitonic emission at ∼385 nm. Electrical measurements indicate n-type conductivity with resistivity ∼34 Ωcm. © 2005 Elsevier B.V. All rights reserved. |
Citation: | Journal of Crystal Growth (2006), 287(1): 139-144 |
URI: | https://doi.org/10.1016/j.jcrysgro.2005.10.057 http://repository.iitr.ac.in/handle/123456789/13957 |
Issue Date: | 2006 |
Keywords: | A1. Doping A1. X-ray diffraction B1. CuCl B2. Wide-band gap semiconductor |
ISSN: | 220248 |
Author Scopus IDs: | 15056648200 57209787039 7004035980 9044337800 7102317773 8842395600 26643140300 35756512900 7005446774 |
Author Affiliations: | O'Reilly, L., Nanomaterials Processing Laboratory, School of Electronic Engineering, Dublin City University, Dublin 9, Ireland Mitra, A., Semiconductor Photonics, Physics Department, Trinity College, Dublin 2, Ireland Natarajan, G., Nanomaterials Processing Laboratory, School of Electronic Engineering, Dublin City University, Dublin 9, Ireland Lucas, O.F., Nanomaterials Processing Laboratory, School of Electronic Engineering, Dublin City University, Dublin 9, Ireland McNally, P.J., Nanomaterials Processing Laboratory, School of Electronic Engineering, Dublin City University, Dublin 9, Ireland Daniels, S., Nanomaterials Processing Laboratory, School of Electronic Engineering, Dublin City University, Dublin 9, Ireland Cameron, D.C., Nanomaterials Processing Laboratory, School of Electronic Engineering, Dublin City University, Dublin 9, Ireland, Advanced Surface Technology Research Laboratory (ASTRaL), Lappeenranta University of Technology, PO BOX 181, 50101 Mikkeli, Finland Bradley, A.L., Semiconductor Photonics, Physics Department, Trinity College, Dublin 2, Ireland Reader, A., Nanomaterials Processing Laboratory, School of Electronic Engineering, Dublin City University, Dublin 9, Ireland, Innos Ltd., Faculty of Electronics and Computing, University of Southampton, Highfield, Southampton, SO17 IBJ, United Kingdom |
Funding Details: | This project is supported by the Irish Research Council for Science Engineering and Technology, IRCSET Basic Research Grant SC/2002/7. |
Corresponding Author: | O'Reilly, L.; Nanomaterials Processing Laboratory, School of Electronic Engineering, Dublin City University, Dublin 9, Ireland; email: oreillyl@eeng.dcu.ie |
Appears in Collections: | Journal Publications [PH] |
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