Effect of sputtering pressure and temperature on DC magnetron sputtered CrN films

Abstract

Chromium nitride thin films were deposited on Si(100) substrate by using DC magnetron sputtering and the influence of process parameters such as substrate temperature, pressure and power on their microstructural characteristics were investigated in the present work. The CrN films were characterised with X-ray diffraction and it was observed that the films exhibit (111) preferred orientation but it transforms in to (200) orientation with increasing working pressure. The preferred orientations of CrN thin films are strongly influenced by sputtering conditions, thickness and the induced microstrain in the thin films. Field emission scanning electron microscopy and atomic force microscopy were used to characterise the morphology and surface topography of the CrN thin films respectively. The as deposited CrN films exhibited columnar morphology and its surface roughness values were influenced by the working pressure and temperature. Similarly, the microstrain in the films exhibited a strong dependence on deposition conditions. © 2010 Maney Publishing.