Skip navigation
Please use this identifier to cite or link to this item: http://repository.iitr.ac.in/handle/123456789/12847
Title: Growth of few- and multilayer graphene on different substrates using pulsed nanosecond Q-switched Nd:YAG laser
Authors: Kumar P.
Kanaujia P.K.
Vijaya Prakash G.
Dewasi A.
Lahiri, Indranil
Mitra, Anirban
Published in: Journal of Materials Science
Abstract: In this report, few- and multilayer graphene was fabricated on different substrates by pulsed laser ablation of a highly ordered pyrolytic graphite target under optimized growth conditions, using a pulsed nanosecond Q-switched Nd:YAG laser at 355 nm (3.5 eV). The nondestructive micro-Raman spectroscopic study on our samples has revealed few- and multilayer graphene formation. The number of graphene layers was found to be reduced with the increase in growth temperature. At substrate temperature of 750 °C, the ratio of intensities (I2D/IG) was calculated from the Raman spectra of the graphene samples to be 0.15 which confirms the multilayer graphene formation, while for graphene film grown at 800 °C, I2D/IG ratio was 0.27 indicating formation of less than five layers of graphene or few-layer graphene. The thickness of few- and multilayer graphene was also confirmed using atomic force microscopy, whereas the microstructure of few- and multilayer graphene was investigated using scanning electron microscopy. The electrical properties in function of growth temperature were evaluated with two-point probe measurements. This work presents a simple, fast, and controllable alternative effective laser technique to synthesize few- or multilayer graphene. © 2017, Springer Science+Business Media, LLC.
Citation: Journal of Materials Science (2017), 52(20): 12295-12306
URI: https://doi.org/10.1007/s10853-017-1327-8
http://repository.iitr.ac.in/handle/123456789/12847
Issue Date: 2017
Publisher: Springer New York LLC
ISSN: 222461
Author Scopus IDs: 57206834879
56184578600
6507873209
57190933816
7004250718
57209787039
Author Affiliations: Kumar, P., High Power Laser Lab, Department of Physics, Indian Institute of Technology Roorkee, Roorkee, 247667, India, Nanomaterials and Applications Lab, Department of Metallurgical and Materials Engineering, Indian Institute of Technology Roorkee, Roorkee, 247667, India
Kanaujia, P.K., Nanophotonics Lab, Department of Physics, Indian Institute of Technology Delhi, Hauz Khas, New Delhi, 110016, India
Vijaya Prakash, G., Nanophotonics Lab, Department of Physics, Indian Institute of Technology Delhi, Hauz Khas, New Delhi, 110016, India
Dewasi, A., High Power Laser Lab, Department of Physics, Indian Institute of Technology Roorkee, Roorkee, 247667, India
Lahiri, I., Nanomaterials and Applications Lab, Department of Metallurgical and Materials Engineering, Indian Institute of Technology Roorkee, Roorkee, 247667, India
Mitra, A., High Power Laser Lab, Department of Physics, Indian Institute of Technology Roorkee, Roorkee, 247667, India
Corresponding Author: Mitra, A.; High Power Laser Lab, Department of Physics, Indian Institute of Technology RoorkeeIndia; email: mitrafph@gmail.com
Appears in Collections:Journal Publications [MT]
Journal Publications [PH]

Files in This Item:
There are no files associated with this item.
Show full item record


Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.