Issue Date | Title | Author(s) |
2016 | A depth analysis for different structures of organic thin film transistors: Modeling of performance limiting issues | Mittal P.; Negi, Yuvraj Singh; Singh R.K. |
2015 | An analytical approach for parameter extraction in linear and saturation regions of top and bottom contact organic transistors | Mittal P.; Negi, Yuvraj Singh; Singh R.K. |
2013 | Analysis of propagation delay and power with variation in driver size and number of shells in multi walled carbon nanotube interconnects | Duksh Y.S.; Kumar Kaushik, Brajesh; Sarkar S.; Singh R. |
2012 | Analysis of top and bottom contact organic transistor performance for different technology nodes | Mittal P.; Negi, Yuvraj Singh; Singh R.K. |
2013 | Analytical modeling and parameter extraction of organic thin film transistor: Effect of contact resistance, doping concentration and field dependent mobility | Mittal P.; Negi, Yuvraj Singh; Singh R.K. |
2012 | Channel length variation effect on performance parameters of organic field effect transistors | Mittal P.; Kumar B.; Negi, Yuvraj Singh; Kumar Kaushik, Brajesh; Singh R.K. |
2011 | Effect of driver size and number of shells on propagation delay in MWCNT interconnects | Duksh Y.S.; Kumar Kaushik, Brajesh; Sarkar S.; Singh R. |
2009 | Effects of process variation in VLSI interconnects - A technical review | Verma K.G.; Kumar Kaushik, Brajesh; Singh R. |
2014 | Impact of source and drain contact thickness on the performance of organic thin film transistors | Mittal P.; Negi, Yuvraj Singh; Singh R.K. |
2015 | Mapping of performance limiting issues to analyze top and bottom contact organic thin film transistors | Mittal P.; Negi, Yuvraj Singh; Singh R.K. |
2011 | Monte Carlo analysis of propagation delay due to process induced line parasitic variations in VLSI interconnects | Verma K.G.; Singh R.; Kumar Kaushik, Brajesh; Kumar B. |
2011 | Organic Thin Film Transistor architecture, parameters and their applications | Mittal P.; Kumar B.; Negi, Yuvraj Singh; Kumar Kaushik, Brajesh; Singh R.K. |
2010 | Performance comparison of carbon nanotube, nickel silicide nanowire and copper VLSI interconnects: Perspectives and challenges ahead | Duksh Y.S.; Kumar Kaushik, Brajesh; Sarkar S.; Singh R. |
2011 | Propagation delay deviations due to process induced line parasitic variations in global VLSI interconnects | Verma K.G.; Singh R.; Kumar Kaushik, Brajesh; Majumder M.K. |
2011 | Propagation delay deviations due to process tempted driver width variations | Verma K.G.; Kumar Kaushik, Brajesh; Singh R.; Kumar B. |
2010 | Propagation Delay Variation due to Process Induced Threshold Voltage Variation | Verma K.G.; Kumar Kaushik, Brajesh; Singh R.; Das V.; VVijaykumar R.; Srinivasa K.G.; Aboalsamh H.A.; Hammoudeh M.; Salmani V.; Tyagi D.K.; Mohapatra A.; Jaysimha B.; Ambikairajah E.; Blackledge J. |
2010 | Propagation delay variations under process deviation in driver interconnect load system | Verma K.G.; Kumar Kaushik, Brajesh; Singh R. |