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Browsing by Author Ohyanagi T.

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Issue DateTitleAuthor(s)
2014Implications of lower zero-field activation energy of dielectric in Al2O3/HfO2 bi-layer dielectric RRAM forming processSarkar, Biplab; Lee B.; Misra V.; Suzuki Y.; Kobayashi K.; Goux L.; Bersuker G.; Magyari-Kope B.; Shima H.; Shingubara S.; Rhie K.; Karim Z.; Ohyanagi T.